GD-10 RF vacuum plasma cleaning machine uses radio frequency, and the processing effect is better in a vacuum environment.
| Input Voltage | AC220 V (±10V) |
| Output Power | 0-300 W |
| Frequency | 13.56 MHz |
| Capacity | 10L |
| Cavity Size | 250(L)*200(W)*200(H) mm |
| Size(L*W*H) | 600*560*520mm |
| Cavity Material | 316 Stainless Steel / Aluminum Alloy |
| Gas Used | Two-way Process Gas Configuration (Available Gas: Ar, O2,N2, Air) |
Surface modification only, preserving bulk properties. Boosts coating and bonding adhesion.
Cognitis enim pilatorum caesorumque funeribus nemo deinde ad has stationes
Cognitis enim pilatorum caesorumque funeribus nemo deinde ad has stationes
Cognitis enim pilatorum caesorumque funeribus nemo deinde ad has stationes
Surface modification only, preserving bulk properties. Boosts coating and bonding adhesion.
Cognitis enim pilatorum caesorumque funeribus nemo deinde ad has stationes
Cognitis enim pilatorum caesorumque funeribus nemo deinde ad has stationes
Cognitis enim pilatorum caesorumque funeribus nemo deinde ad has stationes
Mox dicta finierat, multitudo omnis ad, quae imp erator voluit, promptior laudato consilio consensit in pacem ea ratione maxime percita, quod norat expeditionibus crebris fortunam
Gas is evaporated into plasma
High-energy ions are adsorbed on the surface
High-energy ions react with reactants to form product molecules
Product molecules decompose to form a gas phase
Auxerunt haec vulgi sordidioris a udaciam ob haec festinatis
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Rogatus ad ultimum admissusque in consistorium ambage nulla praegressa inconsiderate
